Nanometrics Training Classes
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Applications Level 1 Training:
- State why you need to measure film thickness
- Determine what is important in the measurement result
- Describe the principles of optical metrology
- Describe which technologies are available to measure film thickness
- Describe the concept of Stage Recipe, Film Strategy, Wafer Recipe, and Cassette Recipe
- Demonstrate use of the main screens and functions of N2000 software: Log in, Setup, Recipes, Processing, Database, etc.
- Demonstrate loading a wafer, running a measurement in Manual Mode using an existing Film Strategy, and checking the results
- Demonstrate creation of all the Stage Recipe types available for blanket wafers
- Demonstrate creation of a Wafer Recipe that uses a radial Stage Recipe and an existing Film Strategy, and display the results and the wafer map
- Demonstrate creation of a Cassette Recipe and run Cassette measurements
- State the principles of Pattern Recognition: Die, Deskew, Die Map, Die Group (of sites), Site PR, Teach Score, Search Score
- Demonstrate use of the N2000 pattern recognition functions
- Demonstrate creation of a complete Stage Recipe for a patterned wafer
- Describe the tips for selecting good pattern recognition images
- Demonstrate ability to export measurement data and import recipes
- Demonstrate the ability to export database and error logs
- Demonstrate the ablity to Reference the tool using the Reference Chip
- Describe why you need to measure critical dimension measurement
- Describe the basic OCD measurement principles
- Demonstrate measuring CD pads using an existing CD Film Strategy
- Describe the basic theory of film parameters, dispersion models
- Demonstrate use of ADAP (advanced data analysis package) main functions
- Demonstrate creation of a few simple Film Strategies
- Describe the concepts: accuracy, repeatability, parameter correlation
- Demonstrate basic Film Strategy optimization
- Demonstrate static repeatability measurements
- Demonstrate archiving spectra and open the files off-line
- Describe & demonstrate pattern recognition troubleshooting
- Demonstrate accessing image libraries and fix a PR failure
- Describe the basic theory of critical dimension measurement
- Demonstrate how to do parameter Recalibration for tool-to-tool matching
MAINTENANCE TRAINING
Custom Tailored to Your Requirements