Nanometrics Training Classes

Applications Level 1 Training:

  • State why you need to measure film thickness
  • Determine what is important in the measurement result
  • Describe the principles of optical metrology
  • Describe which technologies are available to measure film thickness
  • Describe the concept of Stage Recipe, Film Strategy, Wafer Recipe, and Cassette Recipe
  • Demonstrate use of the main screens and functions of N2000 software: Log in, Setup, Recipes, Processing, Database, etc.
  • Demonstrate loading a wafer, running a measurement in Manual Mode using an existing Film Strategy, and checking the results
  • Demonstrate creation of all the Stage Recipe types available for blanket wafers
  • Demonstrate creation of a Wafer Recipe that uses a radial Stage Recipe and an existing Film Strategy, and display the results and the wafer map
  • Demonstrate creation of a Cassette Recipe and run Cassette measurements
  • State the principles of Pattern Recognition: Die, Deskew, Die Map, Die Group (of sites), Site PR, Teach Score, Search Score
  • Demonstrate use of the N2000 pattern recognition functions
  • Demonstrate creation of a complete Stage Recipe for a patterned wafer
  • Describe the tips for selecting good pattern recognition images
  • Demonstrate ability to export measurement data and import recipes
  • Demonstrate the ability to export database and error logs
  • Demonstrate the ablity to Reference the tool using the Reference Chip
  • Describe why you need to measure critical dimension measurement
  • Describe the basic OCD measurement principles
  • Demonstrate measuring CD pads using an existing CD Film Strategy
  • Describe the basic theory of film parameters, dispersion models
  • Demonstrate use of ADAP (advanced data analysis package) main functions
  • Demonstrate creation of a few simple Film Strategies
  • Describe the concepts: accuracy, repeatability, parameter correlation
  • Demonstrate basic Film Strategy optimization
  • Demonstrate static repeatability measurements
  • Demonstrate archiving spectra and open the files off-line
  • Describe & demonstrate pattern recognition troubleshooting
  • Demonstrate accessing image libraries and fix a PR failure
  • Describe the basic theory of critical dimension measurement
  • Demonstrate how to do parameter Recalibration for tool-to-tool matching


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